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        1. RegionGlobal Website
          Pricise Cleaning
          Pricise Cleaning
          In order to meet the increasing requirements of semiconductor manufacturing process, relying on the first-class technical support from the United States and Japan, the company has successfully completed the R&D of ceramic injection technology and mass production, and owns the international advanced cleaning production line, striving to seize the commanding heights of semiconductor and TFT industry technology.
          Technological Development Route Technical Equipment Capability Cleaning process National patent for utility model
          • In 2000

            Founded Surface Treatment Division


          • In 2001

            Successfully developed and mass-produced 350nm line-width semiconductor PVD, CVD parts cleaning process and began to 

            develop semiconductor ETC parts cleaning process

          • In 2003

            Successfully developed and mass-produced 250nm line-width semiconductor PVD, CVD, ETC parts cleaning process. Established 

            an independent laboratory to develop more advanced cleaning process for semiconductors. Started research and development of 

            DIF and LIT parts cleaning process

          • In 2005

            Started cleaning of TFT parts, successfully developed and standardized the cleaning process of the machine parts of 

            semiconductor departments

          • In 2007

            Provided parts cleaning services for a number of semiconductor and TFT factories, and improved the cleaning process of TFT parts

          • In 2011

            Established the first subsidiary----- Ferrotec (Tianjin) Technology Co., Ltd

          • In 2013

            Successfully mass-produced cleaning technology of 45nm line width semiconductor process parts and 8.5 generation line TFT parts

          • In 2015

            Established the second subsidiary---- Ferrotec (Sichuan) Technology Co., Ltd., successfully developed and mass-produced 28nm 

            line width semiconductor process parts cleaning technology

          • In 2017

            The third subsidiary---- Ferrotec (Dalian) Technology Co., Ltd. formally put into production, research and development and

             mass production of 10.5 generation LCD parts cleaning process; improved ceramic spray process and put into mass production, 

            started research and development the 6th generation OLED parts cleaning process, began to develop semiconductor 16nm 

            parts cleaning process

          • In 2018

            The prototype of the surface treatment analysis laboratory of Dalian Plant was established, and the high-tech equipment such 

            as ultrasonic tomography microscope, CMM, He detector, potentiometric titrator, LPC and ICP MS were put into operation.And 

            established high-purity quartz line

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